arXiv:2601.13696v1 Announce Type: new Abstract: Monolayer transition metal dichalcogenide (TMD) field-effect transistors (FETs), with their atomically thin bodies, are promising candidates for future gate-all-around (GAA) nanoribbon architectures. While state-of-the-art Si GAA nanoribbon transistors feature channel widths in the tens of nanometers, most reported TMD-based FETs remain limited to micrometer-scale dimensions, limiting their relevance for ultra-scaled electronics. In this work, we investigate the channel width scaling in nanoribbon transistors based on monolayer MoS2 grown on 2-inch wafers, achieving widths of approximately 30-40 nm. Remarkably, nanoribbon width scaling enhances the on-current by 30-40%, reaching up to 700 uA/um for the smallest-width devices, while also improving the subthreshold slope (SS) to as low as 70 mV/dec. This enhancement is attributed to a stronger electric field at the nanoribbon edges without significant degradation from edge-related scattering. To further demonstrate the scalability of the nanoribbon device, we evaluate the variability of extremely scaled monolayer MoS2 nanoribbon transistor arrays featuring a contact pitch of 60 nm and an effective oxide thickness (EOT) of approximately 0.9 nm. Beyond MoS2, we extend the nanoribbon structure to WS2 n-type and WSe2 p-type FETs, demonstrating a viable path toward complementary monolayer TMD nanoribbon FETs for future ultra-scaled electronics.